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Search for: [Subject and Keywords = PECVD] OR [Subject and Keywords = oxidation] OR [Subject and Keywords = silicon technology] OR [Subject and Keywords = ultrathin layers] OR [Subject and Keywords = gateoxide] OR [Subject and Keywords = RTO] OR [Title = Challenges in ultrathin oxide layers formation, Journal of Telecommunications and Information Technology, 2001, nr 1] OR [Creator = Jakubowski, Andrzej] OR [Creator = Beck, Romuald B.] OR [Creator = Łukasiak, Lidia] OR [Creator = Korwin\-Pawłowski, Michał]

Number of results: 32

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The influence of annealing (900◦C) of ultra-thin PECVD silicon oxynitride layers, Journal of Telecommunications and Information Technology, 2007, nr 3

Jakubowski, Andrzej Beck, Romuald B. Ćwil, Michał Głuszko, Grzegorz Konarski, Piotr Schmeißer, Dieter Hoffmann, Patrick Mroczyński, Robert

2007, nr 3
artykuł
Oxidation kinetic sof silicon strained by silicon germanium, Journal of Telecommunications and Information Technology, 2007, nr 3

Beck, Romuald B. Grabowski, Jarosław

2007, nr 3
artykuł
Comparison of composition of ultra-thin silicon oxynitride layers’ fabricated by PECVD and ultrashallow rf plasma ion implantation, Journal of Telecommunications and Information Technology, 2007, nr 3

Beck, Romuald B. Ćwil, Michał Konarski, Piotr Bieniek, Tomasz Schmeißer, Dieter Hoffmann, Patrick Mroczyński, Robert

2007, nr 3
artykuł
Ultrathin oxynitride films for CMOS technology, Journal of Telecommunications and Information Technology, 2004, nr 1

Jakubowski, Andrzej Beck, Romuald B.

2004, nr 1
artykuł
Comparison of gate leakage current components in metal-insulator-semiconductor structures with high-k gate dielectrics, Journal of Telecommunications and Information Technology, 2001, nr 1

Jakubowski, Andrzej Majkusiak, Bogdan Korwin-Pawłowski, Michał Janik, Tomasz

2001, nr 1
artykuł
Ultra-shallow nitrogen plasma implantation for ultra-thin silicon oxynitride (SiOxNy) layer formation, Journal of Telecommunications and Information Technology, 2005, nr 1

Jakubowski, Andrzej Beck, Romuald B. Bieniek, Tomasz Kudła, Andrzej

2005, nr 1
artykuł
History of Semiconductors, Journal of Telecommunications and Information Technology, 2010, nr 1

Jakubowski, Andrzej Łukasiak, Lidia

2010, nr 1
artykuł
Applying shallow nitrogen implantation from rf plasma for dual gate oxide technology, Journal of Telecommunications and Information Technology, 2007, nr 3

Jakubowski, Andrzej Beck, Romuald B. Ćwil, Michał Głuszko, Grzegorz Konarski, Piotr Bieniek, Tomasz

2007, nr 3
artykuł
Composition and electrical properties of ultra-thin SiOxNy layers formed by rf plasma nitrogen implantation/plasma oxidation processes, Journal of Telecommunications and Information Technology, 2007, nr 3

Jakubowski, Andrzej Beck, Romuald B. Ćwil, Michał Konarski, Piotr Bieniek, Tomasz Schmeißer, Dieter Hoffmann, Patrick

2007, nr 3
artykuł
Silicon microelectronics: where we have come from and where we are heading, Journal of Telecommunications and Information Technology, 2004, nr 1

Jakubowski, Andrzej Łukasiak, Lidia Pióro, Zbigniew

2004, nr 1
artykuł
Modeling SiGe-base HBT using APSYS 2000 - a 2D simulator, Journal of Telecommunications and Information Technology, 2004, nr 1

Jakubowski, Andrzej Łukasiak, Lidia Linkowski, Adam

2004, nr 1
artykuł
Modeling of the inverse base width modulation effect in HBT transistor with graded SiGe base, Journal of Telecommunications and Information Technology, 2007, nr 3

Jakubowski, Andrzej Łukasiak, Lidia Zaręba, Agnieszka

2007, nr 3
artykuł
An impact of frequency on capacitances of partially-depleted SOI MOSFETs, Journal of Telecommunications and Information Technology, 2000, nr 3,4

Jakubowski, Andrzej Tomaszewski, Daniel Łukasiak, Lidia Zaręba, Agnieszka

2000, nr 3,4
artykuł
A model of partially-depleted SOI MOSFETs in the subthreshold range, Journal of Telecommunications and Information Technology, 2001, nr 1

Jakubowski, Andrzej Tomaszewski, Daniel Łukasiak, Lidia Domański, Krzysztof

2001, nr 1
artykuł
An impact of physical phenomena on admittances of partially-depleted SOI MOSFETs, Journal of Telecommunications and Information Technology, 2001, nr 1

Jakubowski, Andrzej Tomaszewski, Daniel Łukasiak, Lidia Gibki, Jan

2001, nr 1
artykuł
Arbitrary waveform generator for charge-pumping, Journal of Telecommunications and Information Technology, 2007, nr 3

Jakubowski, Andrzej Łukasiak, Lidia Pióro, Zbigniew Iwanowicz, Marcin

2007, nr 3
artykuł
Modeling, Simulation and Calibration of Silicon Wet Etching, Journal of Telecommunications and Information Technology, 2009, nr 4

Bieniek, Tomasz Janus, Paweł Kociubiński, Andrzej Duk, Mariusz

2009, nr 4
artykuł
Characterization of SOI fabrication process using gated-diode measurements and TEM studies, Journal of Telecommunications and Information Technology, 2000, nr 3,4

Jakubowski, Andrzej Tomaszewski, Daniel Łukasiak, Lidia Gibki, Jan Ratajczak, Jacek Kątcki, Jerzy

2000, nr 3,4
artykuł
Analysis of the Dispersion of Electrical Parameters and Characteristics of FinFET Devices, Journal of Telecommunications and Information Technology, 2009, nr 4

Jakubowski, Andrzej Tomaszewski, Daniel Łukasiak, Lidia Korwin-Pawlowski, Michael L. Malinowski, Arkadiusz Sekine, Makoto Hori, Masaru

2009, nr 4
artykuł
Novel Method of Improving Electrical Properties of Thin PECVD Oxide Films by Fluorination of Silicon Surface Region by RIE in RF CF4 Plasma, Journal of Telecommunications and Information Technology, 2010, nr 1

Beck, Romuald B. Głuszko, Grzegorz Kalisz, Małgorzata

2010, nr 1
artykuł
The Effect of High Temperature Annealing on Fluorine Distribution Profile and Electro-Physical Properties of Thin Gate Oxide Fluorinated by Silicon Dioxide RIE in CF4 Plasma, Journal of Telecommunications and Information Technology, 2010, nr 1

Beck, Romuald B. Głuszko, Grzegorz Kalisz, Małgorzata

2010, nr 1
artykuł
Artificial adaptive agent model characterized by learning and fairness in the ultimatum games, Journal of Telecommunications and Information Technology, 2007, nr 4

Nishizaki, Ichiro Katagiri, Hideki Hayashida, Tomohiro

2007, nr 4
artykuł
The role of fluorine-containing ultra-thin layer in controlling boron thermal diffusion into silicon, Journal of Telecommunications and Information Technology, 2007, nr 3

Beck, Romuald B. Ćwil, Michał Kalisz, Małgorzata Barcz, Adam

2007, nr 3
artykuł
Adsorption properties of porous silicon, Journal of Telecommunications and Information Technology, 2001, nr 1

Beck, Romuald B. Grabiec, Piotr Gotszalk, Teodor Rangelow, Ivo W. Domański, Krzysztof Dębski, Tomasz

2001, nr 1
artykuł

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