This publication is unavailable to your account. If you have more privileged account please try to use it or contact with the institution connected to this digital library.
Ashburn, Peter ; Głuszko, Grzegorz ; Łukasiak, Lidia ; Gili, Enrico
2007, nr 3
artykuł
This paper presents for the first time the results of charge-pumping (CP) measurements of FILOX vertical transistors. The aim of these measurements is to provide information on the density of interface traps at the Si-SiO2 interface fabricated in a non-standard process. Flat-band and threshold voltage, as well as density of interface traps are determined. Good agreement between threshold-voltage values obtained from CP and I-V measurements is observed.
Instytut Łączności - Państwowy Instytut Badawczy, Warszawa
application/pdf
oai:bc.itl.waw.pl:290
10.26636/jtit.2007.3.833
1509-4553
1899-8852
Journal of Telecommunications and Information Technology
ang
Biblioteka Naukowa Instytutu Łączności
Jul 24, 2024
Jan 27, 2010
181
https://ribes-54.man.poznan.pl/publication/333
RDF
OAI-PMH
Głuszko, Grzegorz Łukasiak, Lidia Gottlob, Heinrich Lemme, Max Szostak, Sławomir
Buiu, Octavian Hall, Stephen Ashburn, Peter Groot de, Kees
Raskin, Jean-Pierre Głuszko, Grzegorz Łukasiak, Lidia Olbrechts, Benoit Kilchytska, Valeriya Flandre, Denis Chung, Tsung Ming
Ericsson, Per Nagasawa, Hiroyuki Abe, Masayuki Strömberg, Helena Schöner, Adolf Bakowski, Mietek
Jakubowski, Andrzej Łukasiak, Lidia Pióro, Zbigniew
Jakubowski, Andrzej Tomaszewski, Daniel Łukasiak, Lidia Domański, Krzysztof
Jakubowski, Andrzej Tomaszewski, Daniel Łukasiak, Lidia Zaręba, Agnieszka
Jakubowski, Andrzej Tomaszewski, Daniel Łukasiak, Lidia Gibki, Jan
Citation style: Chicago ISO690 Chicago
This page uses 'cookies'. More information I understand